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dc.contributor.advisorGallagher, Mark
dc.contributor.authorPedri, Laura Josephine
dc.date.accessioned2017-06-07T20:14:11Z
dc.date.available2017-06-07T20:14:11Z
dc.date.created2005
dc.date.issued2005
dc.identifier.urihttp://knowledgecommons.lakeheadu.ca/handle/2453/3292
dc.description.abstractIn this thesis, a combination of scanning tunneling microscopy and low energy electron diffraction is used to investigate how submonolayer amounts of Au affect the large scale surface morphology of a vicinal Si sample miscut from (111) by 8° toward [11-2]. It is found that the structure of this surface is exquisitely sensitive to Au coverage. The surface exhibits nanofacets whose orientation depends critically on the amount of Au deposited. These nanofacets must preserve the total off-axis angle of the wafer. We find that the (775) facet persists over a wide range of Au coverages up to 0.32 ML. The (775)-Au reconstruction is characterized by a self-assembled array of 1-d atomic chains spaced 21.3 A apart and is optimized at a Au coverage of 0.24± 0.03 ML. Oddly, the stoichiometry at optimal coverage incorporates 1.5 Au atoms per unit cell. The persistence of the (775)-Au reconstruction over such a wide range of Au coverages suggests that it is a low energy surface.
dc.language.isoen_US
dc.subjectSilicon surfaces
dc.subjectNanostructures
dc.subjectGold electric properties
dc.subjectElectron diffraction
dc.subjectAuger electron spectroscopy
dc.subjectScanning tunneling microscopy
dc.titleGold-induced nanostructuring of silicon surfaces
dc.typeThesis
etd.degree.nameMaster of Science
etd.degree.levelMaster
etd.degree.disciplinePhysics
etd.degree.grantorLakehead University


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