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The photochemistry of methoxy-substituted poly(acrylophenones)
(1995)
Poly(p-methoxyacrylophenone) (PMAP),
poly{3,4-dimethoxyacrylophenone) (P34DMAP) and
poly(3,5-dimethoxyacrylophenone) (P35DMAP) were exposed in the
form of dilute solutions and thin films to long-wave UV
radiation (see ...